MUIZZUDIN, Muhamad Azali; ISMAIL, Abd Khamim; OMAR, Muhammad Firdaus. Crystallinity And Morphology Of Silicon Carbide Thin Films Deposited Using Very High Frequency Plasma Enchanced Chemical Vapor Deposition. International Journal of Engineering & Technology, [S. l.], v. 7, n. 4.28, p. 350–353, 2018. DOI: 10.14419/ijet.v7i4.28.22613. Disponível em: https://sciencepubco.com/index.php/ijet/article/view/22613.. Acesso em: 25 nov. 2024.